The formation of a solid from the reaction SiCl4(g) + O2(g)→SiO2(s) + 2Cl2(g)

European Journal of Inorganic Chemistry

Volumn , Issue 6, 2000, Pages 1127-1138

  Binnewies, Michael ^a   Jug, Karl ^b,c,d  

^a Leibniz University Hannover   (Germany)

^b LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^c Theoretica Chimica Acta   (Germany)

^d IIT RESEARCH INSTITUTE   (United States)

Author keywords

Chemical vapor deposition; Chlorine; Growth pattern; Oxygen; Silicon; Thermochemistry

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CHLORINE; CHLORINE COMPOUNDS; SILICA; SILICON OXIDES;

CHEMICAL VAPOUR DEPOSITION; COMPOSITION STRUCTURE; GASEOUS MOLECULES; GROWTH MECHANISMS; GROWTH PATTERNS; THERMALLY INDUCED;

OXYGEN;

CHLORIDE; SILICON DIOXIDE; SILOXANE;

CHEMICAL REACTION; COLLOID; COMBUSTION; REVIEW; STRUCTURE ACTIVITY RELATION; X RAY ANALYSIS;

EID: 0034118809     PISSN: 14341948     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-0682(200006)2000:6<1127::AID-EJIC1127>3.3.CO;2-Y     Document Type: Review

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