Enhanced thermal stability of TA-based thin diffusion barriers by ion implantation

Vacuum

Volumn 69, Issue 1-3, 2002, Pages 91-95

  Peikert, M ^a   Wieser, E ^a   Reuter, H ^a   Wenzel, C ^b  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Diffusion barrier; Ion implantation; Tantalum

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; ION IMPLANTATION; MAGNETRON SPUTTERING; POLYCRYSTALLINE MATERIALS; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

DIFFUSION BARRIERS;

VACUUM TECHNOLOGY;

EID: 0037168612     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00313-5     Document Type: Conference Paper

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