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Volumn 38, Issue 24, 2002, Pages 1580-1581

SiO2-isolated visible amorphous thin-film LED fabricated on crystalline silicon substrate

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CURRENT DENSITY; ELECTROLUMINESCENCE; INTEGRATED OPTOELECTRONICS; OPTICAL PROPERTIES; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SUBSTRATES; THIN FILM DEVICES;

EID: 0037153518     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20021028     Document Type: Article
Times cited : (2)

References (10)
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  • 4
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    • Visible and infrared rare-earth-activated electroluminescence from indium tin oxide Schottky diodes to GaN:Er on Si
    • GARTER, M., et al.: 'Visible and infrared rare-earth-activated electroluminescence from indium tin oxide Schottky diodes to GaN:Er on Si', Appl. Phys. Lett., 1999, 74, (2), pp. 182-184
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    • CHEN, Y.A., et al.: 'Characteristics of SiC-based thin-film LED fabricated using plasma-enhanced CVD system with stainless steel mesh', Electron. Lett., 1999, 35, (15), pp. 1274-1275
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    • Chen, Y.A.1
  • 9
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    • Electrical properties of n-amorphous/p-crystalline silicon heterojunction
    • MATSUURA, H., et al.: 'Electrical properties of n-amorphous/p-crystalline silicon heterojunction', J. Appl. Phys., 1984, 55, (4), pp. 1012-1019
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  • 10
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    • Carrier injection mechanism in a-SiC:H p-i-n junction thin-film LED
    • KRUANGAM, D., et al.: 'Carrier injection mechanism in a-SiC:H p-i-n junction thin-film LED', IEEE Trans. Electron Devices, 1988, 35, (7), pp. 987-965
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.