Atomic mixing and chemical bond formation in MoSx/Fe thin-film system deposited from a laser plume in a high-intensity electrostatic field

Thin Solid Films

Volumn 422, Issue 1-2, 2002, Pages 39-47

  Fominski, V ^a   Nevolin, V ^a   Romanov, R ^a   Smirnov, A ^a   Titov, V ^b   Scharff, W ^c  

^a NATIONAL RESEARCH NUCLEAR UNIVERSITY MEPHI   (Russian Federation)

^b BAIKOV INSTITUTE OF METALLURGY AND MATERIALS SCIENCE   (Russian Federation)

^c Institut fuer Umweltanalysen   (Germany)

Author keywords

Deposition process; Ion implantation; Laser ablation; Multilayers

Indexed keywords

CHEMICAL BONDS; ELECTRIC FIELDS; ION IMPLANTATION; LASER ABLATION; MAGNETIC FIELDS; MULTILAYERS; PULSED LASER DEPOSITION;

ATOMIC MIXING;

THIN FILMS;

EID: 0037147321     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00975-6     Document Type: Article

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