Sims depth profiling analysis of Cu/Ta/SiO2 interfacial diffusion at different annealing temperature

International Journal of Modern Physics B

Volumn 16, Issue 1-2, 2002, Pages 322-327

  Liu, Ling ^a   Gong, Hao ^a   Wang, Yue ^a   Wee, A T S ^a   Liu, Rong ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; SILICON DIOXIDE; TANTALUM;

CONFERENCE PAPER; DIFFUSION; HIGH TEMPERATURE; MASS SPECTROMETRY; REACTION ANALYSIS; TEMPERATURE DEPENDENCE; THICKNESS; VACUUM; X RAY DIFFRACTION;

EID: 0037138059     PISSN: 02179792     EISSN: None     Source Type: Journal    
DOI: 10.1142/s0217979202009822     Document Type: Conference Paper

References (6)