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Volumn 66, Issue 3-4, 2002, Pages 373-378

Crystallinity and stoichiometry of InNx films deposited by reactive dc magnetron sputtering

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; MAGNETRON SPUTTERING; METALLIC FILMS; POLYCRYSTALLINE MATERIALS; STOICHIOMETRY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

EID: 0037136213     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00157-4     Document Type: Article
Times cited : (9)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.