Elemental composition of reactively sputtered indium nitride thin films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 4 A, 1996, Pages 2261-2265

  Kumar, Sunil ^a,b   Mo, Li ^a   Motlan, ^a   Tansley, Trevor L ^a  

^a MACQUARIE UNIVERSITY   (Australia)

^b UNIVERSITY OF NEW ENGLAND   (Australia)

Author keywords

Elemental composition; InN thin films; RBS; Reactive sputtering; XPS

Indexed keywords

ELEMENTAL COMPOSITION; INDIUM NITRIDE; INFRARED SPECTROPHOTOMETRY; REACTIVE SPUTTERING;

COMPOSITION; CRYSTAL MICROSTRUCTURE; FILM GROWTH; FILM PREPARATION; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM COMPOUNDS; SPECTROPHOTOMETRY; SPUTTERING; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILMS;

EID: 0030123685     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.2261     Document Type: Article

References (10)

1. S. Strite and Morkoc: J. Vac. Sci. Technol. B 10 (1992) 1237, and the references therein.
2. T. Matsuoka, H. Tanaka, T. Sasaki and A. Katsui: Inst. Phys. Conf. Ser. No. 106 (IOP Publishing, Bristol, 1990) Chap. 3, p. 141.
3. T. L. Tansley and C. P. Foley: Electron. Lett. 20 (1984) 1066.
4. L. Pauling: The Nature of the Chemical Bond (Cornell University Press, Ithaca, 1967).
5. I. Bello, W. M. Lau, R. P. W. Lawson and K. K. Foo: J. Vac. Sci. Technol. A 10 (1992) 1642.
6. HYPRA RBS Software Users Manual (Charles Evans and Associates, Redwood City, CA, 1992) Ver. 1.0, No. RBS 03, Rev. 1/92, p. 68.
7. M. Kishi, M. Suzuki and K. Ogawa: Jpn. J. Appl. Phys. 31 (1992) 1153.
8. J. F. Moulder, W. F. Stickle, P. E. Sobol and K. D. Bomber: Handbook of X-ray Photoelectron Spectroscopy (Perkin-Elmer, Minnesota, 1992).
9. B. R. Natarajan, A. H. Eltoukhy, J. E. Greene and T. L. Barr: Thin Solid Films 69 (1980) 217.
10. F. Honda and K. Hirokawa: J. Electron Spectrosc. Relat. Phenom. 10 (1977) 125.