Preparation of quaternary ammonium organosilane functionalized mesoporous thin films

Langmuir

Volumn 18, Issue 4, 2002, Pages 972-974

  Wong, Eva M ^a   Markowitz, Michael A ^a   Qadri, Syed B ^b   Golledge, Stephen L ^c   Castner, David G ^c   Gaber, Bruce P ^a  

^a Center for Bio/Molecular Science and Engineering   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

^c UNIVERSITY OF WASHINGTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BLOCK COPOLYMERS; EXTRACTION; HEAT TREATMENT; PORE SIZE; SELF ASSEMBLY; SHRINKAGE; SILANES; SILICA; SPIN COATING; SUBSTRATES; SUPRAMOLECULAR CHEMISTRY; SURFACE ACTIVE AGENTS; THICKNESS MEASUREMENT; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

FUNCTIONALIZED THIN FILMS;

MESOPOROUS MATERIALS;

EID: 0037133479     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la015623k     Document Type: Article

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15. Although the exact Source of this contamination is not known, we note that the nitrogen content is small in relation to the silicon content and is not evident in the other control samples and therefore is net systemic.