Site-controlled deposition of microsized particles using an electrostatic assembly

Advanced Materials

Volumn 14, Issue 22, 2002, Pages 1649-1652

  Fudouzi, Hiroshi ^a   Kobayashi, Mikihiko ^a   Shinya, Norio ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BROWNIAN MOVEMENT; DEPOSITION; ELECTRON EMISSION; ELECTROSTATICS; FLOCCULATION; ION BEAMS; MONOLAYERS; OPTICAL MICROSCOPY; PARTICLE SIZE ANALYSIS; PHOTORESISTS; POLYMERS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SILICON WAFERS; SUSPENSIONS (FLUIDS);

ELECTROSTATIC ASSEMBLY;

MATERIALS SCIENCE;

EID: 0037132298     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(20021118)14:22<1649::AID-ADMA1649>3.0.CO;2-Z     Document Type: Article

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