Kinetics and mechanisms of the thermal degradation of amorphous carbon films

Journal of Applied Physics

Volumn 91, Issue 12, 2002, Pages 9646-9651

  Zhang, Li Hong ^a   Gong, Hao ^a   Wang, Jian Ping ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON THIN FILMS; APPARENT ACTIVATION ENERGY; BONDING RATIO; CARBON PLASMAS; DC MAGNETRON SPUTTERING; DECOMPOSITION MECHANISM; DECOMPOSITION TEMPERATURE; DIFFUSION RESISTANCE; FILM DEPOSITION; FILM STRUCTURE; KINETICS AND MECHANISM; N VALUE; N-TH ORDER REACTION; REACTION ORDERS; SPUTTERING CHAMBER;

AMORPHOUS CARBON; CARBON FILMS; DECOMPOSITION; DEGRADATION; PLASMAS; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS;

PLASMA DEPOSITION;

EID: 0037097913     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1478133     Document Type: Article

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