Effect of implanted metal impurities on superconducting tungsten films

Journal of Applied Physics

Volumn 91, Issue 10 I, 2002, Pages 6516-6519

  Young, B A ^a   Saab, T ^b   Cabrera, B ^b   Miller, A J ^b   Brink, P L ^b   Castle, J P ^b  

^a SANTA CLARA UNIVERSITY   (United States)

^b STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETICS; DC MAGNETRON SPUTTERING SYSTEMS; DILUTION REFRIGERATOR; DOPANT CONCENTRATIONS; DOPED SAMPLE; IMPLANTATION PROCESS; IMPLANTATION TECHNIQUE; LATTICE DISTORTIONS; MAGNETIC ATOMS; MAGNETIC DOPANTS; METAL IMPURITIES; PURE TUNGSTEN; STRUCTURAL CHANGE; SUPERCONDUCTING TRANSITIONS; TUNGSTEN FILMS; XRD;

ANTIFERROMAGNETISM; CHROMIUM; IMPURITIES; ION IMPLANTATION; SEMICONDUCTOR DOPING; SUPERCONDUCTING TRANSITION TEMPERATURE; TUNGSTEN; X RAY DIFFRACTION;

SUPERCONDUCTING FILMS;

EID: 0037094921     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1469690     Document Type: Article

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