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Solid State Communications

Volumn 121, Issue 11, 2002, Pages 609-613

Raman scattering by an inhomogeneous plasma in implanted semiconductors

(5) Ibanez J a Cusco R a Artus L a Gonzalez Diaz G b Jimenez J c

a INSTITUTE OF EARTH SCIENCES JAUME ALMERA (Spain)

b UNIVERSIDAD COMPLUTENSE DE MADRID (Spain)

c UNIVERSIDAD DE VALLADOLID (Spain)

Author keywords

A. Implanted semiconductors; D. Lo phonon plasmon coupled modes

Indexed keywords

CARRIER CONCENTRATION; ION IMPLANTATION; PHONONS; PLASMAS; RAMAN SCATTERING; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING;

IMPLANTED SEMICONDUCTORS;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0037075777 PISSN: 00381098 EISSN: None Source Type: Journal
DOI: 10.1016/S0038-1098(02)00058-3 Document Type: Article

Times cited : (3)

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