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Volumn 37, Issue 9, 2002, Pages 1565-1572
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Deposition and characterization of BN/Si(0 0 1) using tris(dimethylamino)borane
a
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Author keywords
A. Thin films; B. Vapor deposition; C. Atomic force microscopy; C. Infrared spectroscopy; D. Microstructure
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Indexed keywords
ATMOSPHERIC PRESSURE;
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
CRYSTAL MICROSTRUCTURE;
CUBIC BORON NITRIDE;
DETERIORATION;
ELLIPSOMETRY;
HIGH TEMPERATURE EFFECTS;
INFRARED RADIATION;
LIGHT ABSORPTION;
MORPHOLOGY;
OPTICAL FILMS;
REFRACTIVE INDEX;
SEMICONDUCTING SILICON;
SURFACE ROUGHNESS;
SINGLE SOURCE PRECURSORS;
THIN FILMS;
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EID: 0037043636
PISSN: 00255408
EISSN: None
Source Type: Journal
DOI: 10.1016/S0025-5408(02)00844-9 Document Type: Article |
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Times cited : (11)
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References (13)
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