Preparation and characterization of n-type microcrystalline hydrogenated silicon oxide films

Journal of Physics D: Applied Physics

Volumn 35, Issue 11, 2002, Pages 1205-1209

  Sarker, Arindam ^a   Banerjee, Chandan ^a   Barua, A K ^a  

^a DEPARTMENT OF MATERIALS SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS SILICON; CRYSTAL MICROSTRUCTURE; ELECTRIC CONDUCTIVITY; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICA; SILICON SOLAR CELLS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

OPTICAL GAPS;

THIN FILMS;

EID: 0037036014     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/35/11/317     Document Type: Article

References (10)