The behaviour of Cu-xNi (x = 10 to 40 wt%) alloys in alkaline solutions containing chloride ions

Electrochimica Acta

Volumn 42, Issue 10, 1997, Pages 1537-1548

  Milosev I ^a   Metikos Hukovic M ^b  

^a JO EF STEFAN INSTITUTE   (Slovenia)

^b UNIVERSITY OF ZAGREB   (Croatia)

Author keywords

Cu xNi alloys; Localized breakdown; Ni incorporation; Photoelectrochemistry; Voltammetry

Indexed keywords

ALLOYING ELEMENTS; CHLORINE COMPOUNDS; COMPOSITION EFFECTS; CORROSION RESISTANCE; ELECTRIC BREAKDOWN OF SOLIDS; ELECTROCHEMISTRY; INTERFACES (MATERIALS); IONS; MICROSCOPIC EXAMINATION; NICKEL; SEGREGATION (METALLOGRAPHY); SOLUTIONS;

PHOTOELECTROCHEMISTRY; SOLUTE VACANCY INTERACTION MODEL; VOLTAMMETRY;

COPPER ALLOYS;

EID: 0030651796     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(96)00315-5     Document Type: Article

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