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Thin Solid Films

Volumn 408, Issue 1-2, 2002, Pages 87-96

Underlayer work function effect on nucleation and film morphology of chemical vapor deposited aluminum

(1) Rogers, B R a

a VANDERBILT UNIVERSITY (United States)

Author keywords

Aluminum; Chemical vapor deposition (CVD); Nucleation; Work function

Indexed keywords

ALUMINUM; CHEMICAL VAPOR DEPOSITION; COALESCENCE; DENSITY (SPECIFIC GRAVITY); ELECTRONS; MORPHOLOGY; NUCLEATION; PARTICLE SIZE ANALYSIS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SURFACE ROUGHNESS;

WORK FUNCTION EFFECTS;

METALLIC FILMS;

EID: 0037012489 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(02)00144-X Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.