Programmed rate chemical vapor deposition protocols

Journal of the Electrochemical Society

Volumn 147, Issue 2, 2000, Pages 723-730

  Yang, D ^a,b,c,d,e   Kristof, J J ^a   Jonnalagadda, R ^a   Rogers, B R ^a   Hillman, J T ^a   Foster, R F ^a   Cale, T S ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b Molorola   (United States)

^c HONEYWELL   (United States)

^d VANDERBILT UNIVERSITY   (United States)

^e Tokyo Electron Arizona Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; DEGREES OF FREEDOM (MECHANICS); DENSITY (SPECIFIC GRAVITY); ELECTRIC CONDUCTIVITY; FILM PREPARATION; PHYSICAL PROPERTIES; REFLECTION; SURFACE ROUGHNESS; TEMPERATURE; THIN FILMS; TUNGSTEN;

CONSTANT RATE CHEMICAL VAPOR DEPOSITION; NUCLEI DENSITIES; PRECURSOR FLOW; PROGRAMMED RATE CHEMICAL VAPOR DEPOSITION; PULSING;

CHEMICAL VAPOR DEPOSITION;

EID: 0034139979     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393259     Document Type: Article

References (17)

1. S. Sivaram, Chemical Vapor Deposition, pp. 168-169, VNR, New York (1995).
2. T. S. Cale, M. K. Jain, and G. B. Raupp, 7. Electrochem. Soc.. 137, 1526 (1990).
3. K. Masu and K. Tsubouchi, in Advanced Metallization for ULSI Applications in 199-4, R. Blumenthal and G. Janssen, Editors, p. 477, MRS., Pittsburgh, PA (1995).
4. S. Vaidya and A. K. Sinha, Thin Solid Films, 75, 253 (1981).
5. Y. W. Kirn, I. Petrov, and J. E. Green, 7. Vac. Sci. Technol. A, 14, 346 (1996).
6. D. B. Knorr, D. P. Tracy, and K. P. Rodbell, Appl. Phys. Lett., 59, 3241 (1991).
7. D. B. Knorr and T.-M. Lu, Appl. Phys. Lett., 54, 2210 (1989).
8. R. Jairath, A. Jain, R. D. Tolles, M. J. Hampden-Smith, and T. T. Kodas, in The Chemistry of Metal CVD, T. T. Kodas and M. J. Hampden-Smith, Editors, p. 19, VCH, Weinheim (1994).
9. EVOLVE developed under the direction of Timothy S. Cale; version S.Oi released June 1999.
10. T. S. Cale and V. Mahadev, in Thin Films, Vol. 22, S. Rossnagel and A. Ulman, Editors, p. 175, Academic Press, San Diego, CA (1996).
11. L. Song, Ph.D. Thesis, Arizona State University, Tempe, AZ ( 1997).
12. K. Tracy, M.S. Thesis, Arizona State University, Tempe, AZ (1996).
13. J. Kristof, M.S. Thesis, Arizona State University, Tempe, AZ (1999-expected).
14. K.-I. Lee, Y.-S. Kim, and S.-K. Joo, 7. Electrochem. Soc., 139, 3578 (1992).
15. Image Analysis Software version 1.60, free application software available on the website of the Division of Computer Research and Technology, National Institutes of Health (at http://www.nih.gov).
16. J.-Y. Kim, P. J. Reucroft, and D.-K. Park. Thin Solid Films, 289, 184 (1996).
17. E. S. Hwang and J. Lee, J. Vac. Sci. Technol. B, 16, 3015 (1998).