Optimization of ultrathin ALD tantalum nitride films for zero-thickness liner applications

Materials Research Society Symposium - Proceedings

Volumn 716, Issue , 2002, Pages 471-476

  Van Der Straten, Oscar ^a   Zhu, Yu ^a   Eisenbraun, Eric ^a   Kaloyeros, Alain ^a  

^a STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; FILM GROWTH; METALLIZING; OPTIMIZATION; SUBSTRATES; TEMPERATURE; ULTRATHIN FILMS;

ATOMIC LAYER DEPOSITION; TANTALUM NITRIDE; TERTBUTYLIMIDO TRISDIETHYLAMIDO TANTALUM;

NITRIDES;

EID: 0036950518     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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