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Volumn 73, Issue 12, 2002, Pages 4270-4276

A uniaxial tensile stress apparatus for temperature-dependent magnetotransport and optical studies of thin films

Author keywords

[No Author keywords available]

Indexed keywords

BAND STRUCTURE; CARRIER MOBILITY; ELECTRIC CONDUCTIVITY; ELECTRON TRANSPORT PROPERTIES; MAGNETORESISTANCE; OPTICAL PROPERTIES; TENSILE STRESS;

EID: 0036936721     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1516852     Document Type: Article
Times cited : (5)

References (26)
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    • C. M. Wolfe, G. E. Stillman, and J. A. Rossi, J. Electrochem. Soc. 119, 250 (1972); D. Poplavskyy, MS thesis, Imperial College, London, 1999; J. Moussa, L. R. Ram-Mohan, J. Sullivan, T. Zhou, D. R. Hines, and S. A. Solin, Phys. Rev. B 64, 184 410 (2001).
    • (1972) J. Electrochem. Soc. , vol.119 , pp. 250
    • Wolfe, C.M.1    Stillman, G.E.2    Rossi, J.A.3
  • 4
    • 0012445869 scopus 로고    scopus 로고
    • MS thesis, Imperial College, London
    • C. M. Wolfe, G. E. Stillman, and J. A. Rossi, J. Electrochem. Soc. 119, 250 (1972); D. Poplavskyy, MS thesis, Imperial College, London, 1999; J. Moussa, L. R. Ram-Mohan, J. Sullivan, T. Zhou, D. R. Hines, and S. A. Solin, Phys. Rev. B 64, 184 410 (2001).
    • (1999)
    • Poplavskyy, D.1
  • 13
    • 36049057062 scopus 로고
    • J. E. Dmochowski, P. D. Wang, and R. A. Stradling, Semicond. Sci. Technol. 6, 118 (1991); F. H. Pollack and M. Cardona, Phys. Rev. 172, 816 (1968).
    • (1968) Phys. Rev. , vol.172 , pp. 816
    • Pollack, F.H.1    Cardona, M.2
  • 15
    • 0000404049 scopus 로고
    • E. Liarokapis and W. Richter, Meas. Sci. Technol. 3, 347 (1992); E. Liarokapis, D. Papadimitriou, J. Rumberg, and W. Richter, Phys. Status Solidi B 221, 309 (1999).
    • (1992) Meas. Sci. Technol. , vol.3 , pp. 347
    • Liarokapis, E.1    Richter, W.2
  • 18
    • 0001628113 scopus 로고
    • F. H. Pollak, Phys. Rev. 138, 618 (1965); F. H. Pollak and M. Cardona, ibid. 172, 816 (1968); J. E. Rowe, M. Cardona, and F. H. Pollak, Solid State Commun. 6, 239 (1968).
    • (1965) Phys. Rev. , vol.138 , pp. 618
    • Pollak, F.H.1
  • 19
    • 36049057062 scopus 로고
    • F. H. Pollak, Phys. Rev. 138, 618 (1965); F. H. Pollak and M. Cardona, ibid. 172, 816 (1968); J. E. Rowe, M. Cardona, and F. H. Pollak, Solid State Commun. 6, 239 (1968).
    • (1968) Phys. Rev. , vol.172 , pp. 816
    • Pollak, F.H.1    Cardona, M.2
  • 20
  • 25
    • 0012400737 scopus 로고    scopus 로고
    • This is standard practice, although these scattering factors can differ significantly from unity (see Ref. 1)
    • This is standard practice, although these scattering factors can differ significantly from unity (see Ref. 1).
  • 26
    • 0012448105 scopus 로고    scopus 로고
    • Calculations of the Hall scattering factor in Silicon show a very large dependence on strain even at strains as low as 0.1%-see J. E. Dijkstra and W. Th. Wenkebach, J. Appl. Phys. 85, 1587 (1999).
    • (1999) J. Appl. Phys. , vol.85 , pp. 1587
    • Dijkstra, J.E.1    Wenkebach, W.Th.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.