Effects of strain and alloying on the Hall scattering factor for holes in Si and Si1 - xGex

Journal of Applied Physics

Volumn 85, Issue 3, 1999, Pages 1587-1590

  Dijkstra, J E ^a   Wenckebach, W Th ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012448105     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.369290     Document Type: Article

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