A highly manufacturable high density embedded SRAM technology for 90 nm CMOS

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 2002, Pages 415-418

  Fukaura, Yasuhiro ^a   Kasai, Kunihiro ^a   Okayama, Yasunori ^a   Kawasaki, Hirohisa ^a   Isobe, Kazuaki ^a   Kanda, Masahiko ^a   Ishimaru, Kazunari ^a   Ishiuchi, Hidemi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC FUSES; ELECTRODES; FABRICATION; LITHOGRAPHY; MOSFET DEVICES; OPTIMIZATION; STATIC RANDOM ACCESS STORAGE;

GATE ELECTRODES (GC);

CMOS INTEGRATED CIRCUITS;

EID: 0036927960     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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8. M. Fujiwara, et al., Symp. on VLSI Tech., pp.121-122, 1999