Ion mixing in Ag-films on Si-substrates induced by a high fluence 40Ar+ beam with a flux of 0.2 μA/cm2

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 198, Issue 1-2, 2002, Pages 64-72

  Masoud, N M ^a   Arafah, D E ^b   Becker, K H ^a  

^a Stevens Institute of Technology   (United States)

^b UNIVERSITY OF JORDAN   (Jordan)

Author keywords

Alloys; Diffusion and migration; Ion bombardment; Metallic films; Radiation damage; Surface defects; Surface diffusion; Surface thermodynamics

Indexed keywords

DEPOSITION; DIFFUSION; ION BEAMS; NUCLEAR PHYSICS; RADIATION DAMAGE; SILICON; SILVER; THIN FILMS;

ION MIXING;

ION BOMBARDMENT;

EID: 0036898033     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)01515-X     Document Type: Article

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