Ion beam mixing of Ag/Si bilayer

Physica Status Solidi (A) Applied Research

Volumn 172, Issue 1, 1999, Pages 155-163

  Masoud, N M ^a   Arafah, D E ^a,b  

^a UNIVERSITY OF JORDAN   (Jordan)

^b HASHEMITE UNIVERSITY   (Jordan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DIFFUSION IN SOLIDS; ION BEAMS; MIXING; MULTILAYERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; SEMICONDUCTING SILVER COMPOUNDS; SILICON WAFERS; THERMAL EFFECTS; THIN FILMS;

ION BEAM MIXING; RADIATION ENHANCED DIFFUSION (RED);

HETEROJUNCTIONS;

EID: 0033100555     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1521-396x(199903)172:1<155::aid-pssa155>3.0.co;2-v     Document Type: Article

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