Plasma elaboration of barrier layers: A study of the oxides formed at the surface of brass (90Cu10Zn) by RF electric discharges in oxygen

Materials Research Bulletin

Volumn 33, Issue 7, 1998, Pages 1117-1128

  Draou, K ^a   Bellakhal, N ^a   Cheron, B G ^a   Brisset, J L ^a  

^a UNIVERSITÉ DE ROUEN   (France)

Author keywords

A. alloys; A. oxides; A. thin films; C. electrochemical measurements; C. X ray diffraction

Indexed keywords

BRASS; COPPER OXIDES; ELECTRIC DISCHARGES; ELECTROCHEMISTRY; METAL FOIL; OXYGEN; PLASMA APPLICATIONS; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY SPECTROSCOPY; ZINC OXIDE;

INDUCTIVELY COUPLED PLASMAS (ICP); LINEAR SWEEP VOLTAMMETRY;

PROTECTIVE COATINGS;

EID: 0032108679     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0025-5408(98)00074-9     Document Type: Article

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