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Volumn 41, Issue 2, 1996, Pages 206-216

Copper oxides formation by a low pressure RF oxygen plasma

Author keywords

Cu2O; Cu3O2; CuxO; CuO; FTIR; Oxygen plasma; Photoluminescence

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; OXIDATION; OXYGEN; PHOTOLUMINESCENCE; PLASMA APPLICATIONS; PRESSURE EFFECTS; ULTRAVIOLET SPECTROSCOPY;

EID: 0000823583     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01674-1     Document Type: Article
Times cited : (18)

References (43)
  • 6
    • 0004266780 scopus 로고
    • Kinetics of dissociation processes in plasma in the low pressure range
    • Spinger-Verlag
    • M. Capitelli and E. Molinari, Kinetics of dissociation processes in plasma in the low pressure range, in Topics in current Chemistry 90, Spinger-Verlag, 1980.
    • (1980) Topics in Current Chemistry , vol.90
    • Capitelli, M.1    Molinari, E.2
  • 24
    • 0041778345 scopus 로고
    • Ph.D. Thesis, Rouen
    • J.M. Machefert, Ph.D. Thesis, Rouen, 1990.
    • (1990)
    • Machefert, J.M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.