Aberration characteristics of immersion lenses for LVSEM

Ultramicroscopy

Volumn 93, Issue 3-4, 2002, Pages 331-338

  Khursheed, Anjam ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Immersion lenses; Low voltage scanning electron microscopy (LVSEM); On axis aberrations

Indexed keywords

ABERRATIONS; ELECTRIC FIELDS; SCANNING ELECTRON MICROSCOPY;

IMMERSION LENSES;

MAGNETIC LENSES;

ANALYTICAL ERROR; ARTICLE; ENERGY; IMAGE ENHANCEMENT; IMAGE RECONSTRUCTION; MODEL; OPTICAL INSTRUMENTATION; OPTICAL RESOLUTION; PREDICTION; SCANNING ELECTRON MICROSCOPY; SIMULATION; VACUUM;

EID: 0036890615     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(02)00288-7     Document Type: Article

References (12)

1. Tsuno K. Orloff J. Magnetic Lenses for Electron Microscopy in the Handbook of Charged Particle Optics. 1997;CRC Press LLC, Boca Raton, FL.
2. Lencová B. Orloff J. Electrostatic Lenses in the Handbook of Charged Particle Optics. 1997;CRC Press LLC, Boca Raton, FL.
3. Tsuno K., Handa N., Matsumoto S. SPIE. 2522:1995;243.
4. Zach J. Proceedings of EUREM 12. Brno, Czech Republic. III:2000;169.
5. Sato M., Todokoro H., Kageyama K. SPIE Charge Particle Opt. 2014:1993;17.
6. Frank L., Mullerová I. J. Electron. Microsc. 48(3):1999;205.
7. Yau Y.W., Pease R.F., Iranmanesh A.A., Polasko K.J. J. Vac. Sci. Technol. 19(4):1981;1048.
8. P.W. Hawkes, E. Kasper, Principles of Electron Optics, Vol. 2, Academic Press, 1989, p. 632.
9. A. Khursheed, KEOS, Electrical Engineering Department, The National University of Singapore, 10 Kent Ridge Crescent, Singapore, 1995.
10. L. Reimer, Scanning Electron Microscopy, 2nd Edition, Springer, 1998, p. 32.
11. Bath J.E., Kruit P. Optik. 101(3):1996;101.
12. Shao Z. Rev. Sci. Instrum. 59(9):1988;1985.