Extendibility of proximity x-ray lithography to 25 nm and below

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2979-2983

  Toyota, Eijiro ^a   Washio, Masakazu ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION GRATINGS; LIGHT SOURCES; MASKS; MATHEMATICAL MODELS; POLYMETHYL METHACRYLATES; SYNCHROTRONS;

BLUR EFFECT; SIGMA VALUES; STEPPERS;

X RAY LITHOGRAPHY;

EID: 0036883218     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1524972     Document Type: Article

References (9)

1. Y. Vladimirsky, A. Bourdillon, O. Vladirsky, W. Jiang, and Q. Leonard, J. Phys. D 32, L1 (1999).
2. E. Toyota, T. Hori, M. Khan, and F. Cerrina, J. Vac. Sci. Technol. B 19, 2428 (2001).
3. W. Chu, H. Smith, and M. Schattenburg, Appl. Phys. Lett. 59, 1641 (1991).
4. S. Hector, M. Schattenburg, E. Anderson, W. Chu, V. Wong, and H. Smith, J. Vac. Sci. Technol. B 10, 3164 (1992).
5. T. Hori and T. Takayama, Proceedings of ICSRS-AFSR'95, Pohang, Korea, 1995.
6. E. Toyota and M. Wahino, J. Appl. Phys. 41 (2002).
7. M. Khan, G. Han, S. Bollepali, F. Cerrina, and Mardonado, J. Vac. Sci. Technol. B 17, 3426 (1999).
8. G. Han and F. Cerrina (private communication, 2002).
9. K. Early, M. Schttenburg, and H. Smith, Microelectron. Eng. 11, 317 (1990).