Prospects for photolithography at 121 nm

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2567-2573

  Liberman, V ^a   Rothschild, M ^a   Murphy, P G ^a   Palmacci, S T ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FLUORINE COMPOUNDS; LIGHT ABSORPTION; PHOTORESISTS; PLASMA SOURCES; TRANSPARENCY;

CONTACT PRINTING; PHASE SHIFTING MASK;

PHOTOLITHOGRAPHY;

EID: 0036883118     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1524974     Document Type: Article

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