Multilevel silicon diffractive optics for terahertz waves

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2780-2783

  Walsby, E D ^a   Wang, S ^b   Xu, J ^b   Yuan, T ^b   Blaikie, R ^a   Durbin, S M ^a   Zhang, X C ^b   Cumming, D R S ^c  

^a UNIVERSITY OF CANTERBURY   (New Zealand)

^b RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^c UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

LENSES; PHOTORESISTS; REACTIVE ION ETCHING; REFRACTIVE INDEX; SILICON;

FRESNEL LENSES; MULTILEVEL RESIST PROCESSING; REFRACTIVE OPTIC LENSES; TERAHERTZ WAVES;

DIFFRACTIVE OPTICS;

EID: 0036874021     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1518021     Document Type: Article

References (9)

1. D. R. S. Cumming, I. I. Khandaker, S. Thomas, and B. G. Casey, J. Vac. Sci. Technol. B 15, 2859 (1997).
2. S. Noach, A. Lewis, Y. Arieli, and N. Eisenberg, Appl. Opt. 35, 3635 (1996).
3. M. B. Stern, Microelectron. Eng. 32, 369 (1996).
4. E. D. Walsby, R. Cheung, R. J. Blaikie, and D. R. S. Cumming, Proc. SPIE 79, 3879 (1999).
5. K. E. Bean, IEEE Trans. Electron Devices 25, 1185 (1978).
6. A. Tserepi, E. Gogolides, C. Cardinaud, L. Rolland, and G. Turban, Microelectron. Eng. 41-42, 411 (1998).
7. R. Legtenberg, H. Jansen, M. de Boer, and M. Elwenspoek, J. Electrochem. Soc. 142, 2020 (1995).
8. H. Jansen, M. Boer, J. Burger, R. Legtenberg, and M. Elwenspoek, Microelectron. Eng. 27, 475 (1995).
9. B. Ferguson, S. Wang, and X.-C. Zhang, Proceedings of the 14th Annual Meeting of The IEEE Laser & Electro-Optics Society, San Diego, CA, November 2001, PD1.7.