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Volumn 41, Issue 11, 2002, Pages 6493-6497

Growth and characterization of diamond films on SiO2/Si substrates

Author keywords

Cracks; Diamond films; MPECVD; Shrinkage; SiO2 Si substrates

Indexed keywords

CHARACTERIZATION; CRACK INITIATION; FILM GROWTH; INSULATING MATERIALS; MICROWAVES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SHRINKAGE; SILICA; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0036872483     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.6493     Document Type: Article
Times cited : (1)

References (13)
  • 13
    • 0012535415 scopus 로고
    • Ed. 131st Committee (Thin Film) of Japan Society for the Promotion of Science (Ohmsha, Tokyo) [in Japanese].
    • Thin Film Handbook, ed. 131st Committee (Thin Film) of Japan Society for the Promotion of Science (Ohmsha, Tokyo, 1983) p. 11 [in Japanese].
    • (1983) Thin Film Handbook , pp. 11


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.