Implant layers: Leading-edge noncritical lithography

Microlithography World

Volumn 11, Issue 4, 2002, Pages 18-22

  Gu, Yiming ^b   Sturtevant, John ^a  

^a R and D Division   (United States)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; BOUNDARY CONDITIONS; CMOS INTEGRATED CIRCUITS; MASKS; MEASUREMENTS; TRANSISTORS;

IMPLANT LAYERS;

PHOTOLITHOGRAPHY;

EID: 0036865174     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (10)

1. P. Fallon, et al., "Development of DUV Resist for Zero and Angled Implant Applications," SPIE Symposium on Advances in Resist Technology and Process, Vol. 4345, p. 601, 2001.
2. M. Mori, et al., "Thick Film Positive DUV Photoresist for Implant Layer Application," SPIE Symposium on Advances in Resist Technology and Process, Vol. 3999, p. 601, 2000.
3. H. Puchner, et al., "Minimizing Thick Resist Sidewall Slope Dependence on Design Geometry by Optimizing Bake Conditions," Microelectron. Eng., Vol. 53, p. 429, 2000.
4. C. Norton, et al., "Photoresist Properties During High Current Implantation: an i-line vs. DUV Resist Comparison," 2000 Intl Conf on Ion Implantation Technology Proc, pp. 813-816, 2000.
5. J. Word., D. Chou, Y. Gu, J. Sturtevant, "Reduction of Reflective Notching Through Illumination Optimization," SPIE, to be published, 2002.
6. R. Socha, C. Progler, A. Neureuther, "The Effect of Partial Coherence on Reflective Notching," SPIE, Vol. 3051, p. 479, 1997.
7. Chris A. Mack, "The Effect of Numerical Aperture and Partial Coherence on Swing Curve," Microlithography World, Vol. 6, No. 4, Autumn 1997.
8. Y. Gu, D. Chou, S.Y. Lee, W. Roche, J. Sturtevant, "Reduction of Implantation Shadowing Effect by Double Exposure Photo Process," Proc. SPIE 2002, to be published.
9. H. Takatsuka, et al., "Influence of Tilted High-Energy Ion-Implantation Upon Scaled CMOS Structure," Proceedings of the 1995 International Conference on Microeleetronic Test Structures (ICMTS), p. 247, 1995.
10. W. Montgomery, et al., "Studies Directed to the Design and Development of High Energy Implant Resist," Proc. SPIE 3999, p. 531, 2000.