Correlation of resistance and interfacial reaction of contacts to n-type InP

Journal of Materials Research

Volumn 17, Issue 11, 2002, Pages 2929-2934

  Huang, J S ^a   Vartuli, C B ^b   Nguyen, T ^a   Bar Chaim, N ^a   Shearer, J ^b   Fisher, C ^b   Anderson, S ^b  

^a Emcore   (United States)

^b AGERE SYSTEMS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC RESISTANCE MEASUREMENT; ENERGY DISPERSIVE SPECTROSCOPY; GOLD COMPOUNDS; HETEROJUNCTIONS; INTERFACES (MATERIALS); NICKEL COMPOUNDS; OHMIC CONTACTS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

CONTACT RESISTANCE; INTERFACIAL REACTION; SCANNING TRANSMISSION ELECTRON MICROSCOPY;

SEMICONDUCTING INDIUM PHOSPHIDE;

EID: 0036863679     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2002.0424     Document Type: Article

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