Multiscale modeling of anisotropic wet chemical etching of crystalline silicon

Europhysics Letters

Volumn 60, Issue 3, 2002, Pages 467-473

  Gosalvez M A ^a   Foster, A S ^a   Nieminen, R M ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0036850050     PISSN: 02955075     EISSN: None     Source Type: Journal    
DOI: 10.1209/epl/i2002-00287-1     Document Type: Article

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