Atomic configuration in core structure of Lomer dislocation in Si0.76Ge0.24/Si

Ultramicroscopy

Volumn 93, Issue 2, 2002, Pages 139-146

  Wang, D ^a   Chen, H ^a   Li, F H ^a   Kawasaki, K ^b   Oikawa, T ^b  

^a INSTITUTE OF PHYSICS   (China)

^b JEOL LTD   (Japan)

Author keywords

Deconvolution; Dynamical diffraction effect correction; High resolution electron microscopy; Lomer dislocation

Indexed keywords

DIFFRACTION; FIELD EMISSION MICROSCOPES; GERMANIUM; IMAGING TECHNIQUES; SILICON;

ATOMIC CONFIGURATION;

MICROSCOPIC EXAMINATION;

GERMANIUM DERIVATIVE; SILICON DERIVATIVE;

ANALYTIC METHOD; ARTICLE; ATOMIC PARTICLE; CHEMICAL STRUCTURE; DIFFRACTION; ELECTRON MICROSCOPY; EXPERIMENTATION; IMAGE PROCESSING; IMAGE QUALITY; OPTICAL RESOLUTION; SIMULATION;

SIGE;

EID: 0036837317     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-3991(02)00154-7     Document Type: Article

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