Optical absorption properties of Cu and Ag double negative-ion implanted silica glass

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 195, Issue 3-4, 2002, Pages 315-319

  Tsuji, H ^a   Kurita, K ^a   Gotoh, Y ^a   Kishimoto, N ^b   Ishikawa, J ^a  

^a KYOTO UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Nanoparticle; Negative ion implantation; Surface plasmon resonance absorption

Indexed keywords

ANNEALING; COPPER; FUSED SILICA; LIGHT ABSORPTION; NANOSTRUCTURED MATERIALS; NEGATIVE IONS; PHOTONS; SILVER; SURFACE PLASMON RESONANCE;

PHOTON ENERGY;

ION IMPLANTATION;

EID: 0036798473     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)01132-1     Document Type: Article

References (11)

1. Hosono H., Abe Y. Appl. Phys. Lett. 60:1992;261.
2. Magruder III R.H., Zuhr R.A., Osborne J.D.H. Nucl. Instr. and Meth. B. 99:1995;590.
3. Anderson T.S., Magruder III R.H., Zuhr R.A., Wittig J.E. J. Electron. Mater. 25:1996;27.
4. Tsuji H., Toyota Y., Ishikawa J., Sakai S., Okayama Y., Nagumo S., Gotoh Y., Matsuda K. Coffa S., Ferla G., Priolo F., Rimini E. Ion Implantation Technology - 94. 1995;612 Elsevier, Amsterdam.
5. Ishikawa J., Tsuji H., Toyota Y., Gotoh Y., Matsuda K., Tanjyo M., Sakai S. Nucl. Instr. and Meth. B. 96:1995;7.
6. Tsuji H., Ishikawa J., Ikeda S., Gotoh Y. Nucl. Instr. and Meth. B. 127/128:1997;278.
7. Tsuji H., Gotoh Y., Ishikawa J. Nucl. Instr. and Meth. B. 141:1998;645.
8. Tsuji H., Kido S., Sasaki H., Gotoh Y., Ishikawa J. Rev. Sci. Instr. 71:2000;804.
9. Biersack J.P. Nucl. Instr. and Meth. B. 27:1987;21.
10. Hansen M. Constitution of Binary Alloys. second ed. 1958;18 McGraw-Hill, New York.
11. Castro T., Reifenberger R., Choi E., Anderson R. Phys. Rev. B. 42:1990;8548.