Pulsed KrF excimer laser annealing of silicon solar cell

Solar Energy Materials and Solar Cells

Volumn 74, Issue 1-4, 2002, Pages 289-294

  Azuma, H ^a   Takeuchi, A ^a   Ito, T ^a   Fukushima, H ^a   Motohiro, T ^a   Yamaguchi, M ^b  

^a Rd Management Section   (Japan)

^b TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

Author keywords

Crystalline; Excimer laser; Heat flow simulation; Laser annealing; Silicon film; Solar cell

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CRYSTALLINE MATERIALS; CRYSTALLIZATION; EXCIMER LASERS; FINITE DIFFERENCE METHOD; LASER BEAM EFFECTS; PULSED LASER APPLICATIONS; THERMAL DIFFUSION IN SOLIDS;

LASER ANNEALING;

SILICON SOLAR CELLS;

EID: 0036778582     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(02)00087-9     Document Type: Article

References (5)

1. Perspectives of crystalline silicon thin film solar cells
2. Excimer laser crystallization and doping of silicon films on plastic substrates
3. Poly silicon TFT annealing with XeCl excimer laser
4. Transient thermal analysis of excimer laser annealed poly crystalline Si films
5. Growth of micro-crystalline silicon film by electron beam excited plasma chemical vapor deposition without hydrogen dilution