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Volumn 17, Issue 9, 2002, Pages 22-27

Microthrusters in silicon for aerospace application

Author keywords

[No Author keywords available]

Indexed keywords

AEROSPACE APPLICATIONS; CODES (SYMBOLS); COMPUTER SIMULATION; FINITE ELEMENT METHOD; MICROELECTROMECHANICAL DEVICES; SATELLITES; SILICON WAFERS;

EID: 0036760641     PISSN: 08858985     EISSN: None     Source Type: Journal    
DOI: 10.1109/MAES.2002.1039790     Document Type: Review
Times cited : (9)

References (10)
  • 1
    • 84906960092 scopus 로고    scopus 로고
    • thAIAA/USU Small Satellite Conference, North Logan, UT.
  • 2
    • 0344146574 scopus 로고    scopus 로고
    • Pyrotechnic actuators: A new generation of Si integrated circuit
    • 1999
    • C. Rossi, D. Esteve and C. Mingues, (1999), Pyrotechnic actuators: a new generation of Si integrated circuit, Sensor and Actuators 74 (1999) 211-214.
    • (1999) Sensor and Actuators , vol.74 , pp. 211-214
    • Rossi, C.1    Esteve, D.2    Mingues, C.3
  • 3
    • 84906965509 scopus 로고    scopus 로고
    • thAnnual/USU Conference on Small Satellites.
  • 5
    • 84906965510 scopus 로고    scopus 로고
    • C. Rossi, M.D. Rouhani and D. Esteve, 5 November 1999, Prediction of the performance of a Si-micromachined microthruster by computing the subsonic gas flow inside the thruster.
  • 6
    • 0033888241 scopus 로고    scopus 로고
    • Differences in anisotropic etching properties of KOH and TMAH solutions
    • M. Shikida, K. Sato and D. Uchikawa, (2000), Differences in anisotropic etching properties of KOH and TMAH solutions, Sensor and Actuators 80, 179-188.
    • (2000) Sensor and Actuators , vol.80 , pp. 179-188
    • Shikida, M.1    Sato, K.2    Uchikawa, D.3
  • 7
    • 84906965401 scopus 로고    scopus 로고
    • A. Ploéul and G. Kraéuter, 12 October 1998, Wafer direct bonding: tailoring adhesion between brittle materials, Max Planck Institute fu er Mikrostrukturphysik. Weinberg 2, D-06120, Halle (Saale), Germany.
  • 8
    • 0032187740 scopus 로고    scopus 로고
    • Silicon anisotropic etching in alkaline soultions 1. The geometric description of figures developed under etching Si (100) in various solutions
    • I. Zubel and I. Barycka, (1998), Silicon anisotropic etching in alkaline soultions 1. The geometric description of figures developed under etching Si (100) in various solutions, Sernsor and Actuators A 70, 250-259.
    • (1998) Sernsor and Actuators A , vol.70 , pp. 250-259
    • Zubel, I.1    Barycka, I.2
  • 10
    • 84906962754 scopus 로고    scopus 로고
    • A. Ploéul and G. Kraéuter, October 1998, Max-Planck-Institute fu Er Mikrostrukturphysic, Wafer direct bonding: tailoring adhesion between brittle materials, Weinberg 2, D-06120, Halle (Saale), Germany, Accepted October 12, 1998.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.