Microcoils and microrelays - an optimized multilayer fabrication process

Sensors and Actuators, A: Physical

Volumn 83, Issue 1, 2000, Pages 124-129

  Ohnmacht, Markus ^a   Seidemann, Volker ^b   Büttgenbach, Stephanus ^b  

^a ROBERT BOSCH GMBH   (Germany)

^b TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BUTENES; DRY ETCHING; ELECTRIC COILS; ELECTRIC CURRENTS; ELECTRIC RELAYS; ELECTROPLATING; MAGNETIC CORES; MICROSTRUCTURE; MULTILAYERS; PASSIVATION; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

BENZOCYCLOBUTENE; MICROCOILS; MICRORELAYS;

MICROELECTROMECHANICAL DEVICES;

EID: 0033750389     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(00)00286-7     Document Type: Article

References (12)

1. Ohnmacht M., Hahn D., Büttgenbach S. A double-layer, double-coil proximity sensor fabricated by UV depth lithography. Proc. of Eurosensors XII, Southampton, UK, Sept. 13-16. 1998;15-18.
2. Acosta R.E., Ahn C.H., Babich I.V., Chaimer T.J., Cooper E.I., Cotte J.M., Horkans J.W., Hedge S., Jahnes C., Krongelb S., Kwietniak K.T., LaBianca N.C., O'Sullivan E.J.M., Pomerene A.T., Rath D.L., Romankiw L.T., Tornello J.A. Integrated variable reluctance magnetic mini-motor. Proceedings - Electrochemical Society. 95(18):1995;508-519.
3. Ahn C., Allen M. A planar micromachined spiral inductor for integrated magnetic microactuator applications. Journal of Micromechanics and Microengineering. 3:1993;37-44.
4. Watanabe Y., Edo M., Nakazawa H., Yonezawa E. A new fabrication process of a planar coil using photosensitive polyimide and electroplating. 8th Int. Conf. on Solid-State Sensors and Actuators, Eurosensors IX, Stockholm, Sweden, June 25-29:1995;268-271.
5. Miyajima H., Mehregany M. High aspect photolithography for MEMS applications. Journal of Micromechanical Systems. 4:1995;220-229.
6. Moyer E., Rutter E., Bernius M., Townsend P., Harris R. Photodefinable benzocyclobutene formulations for thin film microelectronic applications. IEPS Proceedings, Austin, September. 1992.
7. Strandjord A., Rogers W., Cummings S. MCM-D fabrication with photosensitive benzocyclobutene. ISHM '95 Proceedings. 1995;402-417.
8. Bair H., Pryde C. Curing and glass transition behavior of a benzocyclobutene polymer. ANTEC '91 Proceedings. 1991;1550-1553.
9. Lee J., Englisch J., Ahn C., Allen M.G. Planariziation techniques for vertically integrated metallic MEMS on silicon foundry circuits. Journal of Micromechanics and Microengineering. 7:1997;44-54.
10. Chinoy P.B. Reactive ion etching of benzocyclobutene polymer films. IEEE Transactions on Components, Packaging and Manufacturing Technology. 20(3):1997;199-206.
11. Rogers B., Berry M.J., Turlik I., Garrou P., Castillo D. Soft mask for via patterning in benzocyclobutene. International Journal of Microcircuits and Electronic Packaging. 3:1994;210-218.
12. Taylor W., Allen M. Integrated magnetic microrelays: normally open, normally closed, and multi-pole devices. Proceedings of Transducers 97, Chicago, IL, USA, June 16-19:1997;1149-1152.