Preparation and characteristics of porous silica films by a modified base-catalyzed sol-gel process containing PVA: II. Film preparation

Journal of Sol-Gel Science and Technology

Volumn 25, Issue 2, 2002, Pages 103-111

  Liu, Y ^a,c   Chen, H ^a   Zhang, L ^b   Yao, X ^b  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b TONGJI UNIVERSITY   (China)

^c AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Porous film; SiO2; Sol gel; Thermal conductivity; Thickness

Indexed keywords

ELLIPSOMETRY; FILM PREPARATION; GELATION; MICROSTRUCTURE; POLYVINYL ALCOHOLS; POROSITY; POROUS MATERIALS; SCANNING ELECTRON MICROSCOPY; SOL-GELS; SYNTHESIS (CHEMICAL); THERMAL CONDUCTIVITY OF SOLIDS; X RAY DIFFRACTION ANALYSIS;

MODIFIED BASE-CATALYZED PROCESS; POROUS SILICA FILMS; SOL-GEL TRANSITION; THICKNESS;

SILICA;

EID: 0036748823     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1019951909928     Document Type: Article

References (11)

1. D.W. Schaefer, MRS Bulletin 4, 49 (1994).
2. M.A. Fardad, E.M. Yeatman, E.J.C. Dawnay, M. Green, and F. Horowitz, J. Non-Cryst. Solids 183, 260 (1995).
3. M. Menning, G. Jonschker, and H. Schmidt, Sol-Gel Optics II, SPIE 1758, 125 (1992).
4. C.K. Jorgensen, and R. Reisfeld, Optical and Electronic Phenomena in Sol-Gel/Glasses and Modern Application (Springer, Germany, 1996).
5. P.J. Bruinsma, N.J. Hess, J.R. Bontha, J. Liu, and S. Baskaran, in Low-dielectric Constant Materials: II Symposium (organized by MRS), Boston, USA, 1997, p. 105.
6. Y. Liu, W. Ren, L.Y. Zhang, and X. Yao, Thin Solid Films 353, 124 (1999).
7. C.E. Krohn and A.H. Thompson, Physical Review B 33(9), 6366 (1986).
8. M. Born and E. Wolf, Principles of Optics (Pergamon Press, New York, 1975).
9. J.K. Hong, H.S. Yang, M.H. Jo, H.H. Park, and S.Y. Choi, Thin Solid Films 308/309, 495 (1997).
10. M.C. Gomes, A.C. Fernades, and B.S. Almeida, J. Mater. Sci. 30, 3893 (1995).
11. Y. Liu, W.S. Shi, W. Ren, L.Y. Zhang, and X. Yao, Journal of Xi'an Jiaotong University 9, 105 (1998).