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Physica Status Solidi (B) Basic Research

Volumn 233, Issue 1, 2002, Pages 18-23

Ab-initio modeling of boron and oxygen diffusion in polycrystalline HfO2 films

(1) Liu, Chun Li a

a MOTOROLA INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0036732199 PISSN: 03701972 EISSN: None Source Type: Journal
DOI: 10.1002/1521-3951(200209)233:1<18::AID-PSSB18>3.0.CO;2-K Document Type: Conference Paper

Times cited : (10)

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