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Diamond and Related Materials

Volumn 11, Issue 9, 2002, Pages 1653-1659

Effects of substrate bias on nanotribologyof a-C:H films deposited by ECR-MPCVD

(3) Fang, Te Hua a Weng, Cheng I b Chiang, Ming Jeng c

a SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

b NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

c Sinonar Corp (Taiwan)

Author keywords

a C:H films; Electron cyclotron resonance microwave plasma chemical vapor deposition; Nanotribology; Scanning probe microscopy

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TRIBOLOGY;

CARBON FILMS;

AMORPHOUS FILMS;

CARBON; COATING; DIAMOND-LIKE CARBON; FILM; HARDNESS; PLASMA TREATMENT; TRIBOLOGY; WEAR RESISTANCE;

EID: 0036720574 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(02)00136-X Document Type: Article

Times cited : (16)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.