Deposition and properties of a-C:H films on polymethyl methacrylate by electron cyclotron resonance microwave plasma chemical vapor deposition method

Surface and Coatings Technology

Volumn 123, Issue 2-3, 2000, Pages 273-277

  Zhou, X T ^a   Lee, S T ^a   Bello, I ^a   Cheung, A C ^a   Chiu, D S ^a   Lam, Y W ^a   Lee, C S ^a   Leung, K M ^a   He, X M ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

a C:H films; Electron cyclotron resonance microwave plasma chemical vapor deposition (ECR MPCVD); PMMA

Indexed keywords

AMORPHOUS FILMS; DECOMPOSITION; FILM GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMETHYL METHACRYLATES; WEAR RESISTANCE;

DIAMOND-LIKE CARBON FILMS; ELECTRON CYCLOTRON RESONANCE MICROWAVE PLASMA DECOMPOSITION; POLYMER-LIKE CARBON FILMS;

PROTECTIVE COATINGS;

COATING; DIAMOND-LIKE CARBON; FILM; TRIBOLOGY; VAPOR DEPOSITION; WEAR RESISTANCE;

EID: 0034707771     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00479-X     Document Type: Article

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