Amorphous wire and CMOS IC-based sensitive micro-magnetic sensors (MI sensor and SI sensor) for intelligent measurements and controls

Journal of Magnetism and Magnetic Materials

Volumn 249, Issue 1-2, 2002, Pages 351-356

  Mohri, K ^a   Uchiyama, T ^a   Shen, L P ^a   Cai, C M ^a   Panina, L V ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b Moscow Engineering Physical Institute Technical University   (Russian Federation)

Author keywords

Amorphous wires and films; Magnetoimpedance; Magnetostriction; Skin effect

Indexed keywords

AMORPHOUS FILMS; CMOS INTEGRATED CIRCUITS; ELECTRIC IMPEDANCE; ELECTRIC WIRE; INTELLIGENT CONTROL; MAGNETOSTRICTION; SENSORS; SKIN EFFECT; STRESSES;

AMORPHOUS WIRES; MAGNETOIMPEDANCE (MI) SENSORS; STRESS IMPEDANCE (SI) SENSORS;

MAGNETOELECTRIC EFFECTS;

EID: 0036701359     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(02)00558-9     Document Type: Conference Paper

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