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Volumn 22, Issue 8, 2002, Pages 1008-1010

Sub-wavelength gratings based on a new microfabrication technology

Author keywords

Electron beam scanning exposure; Fast atom beam etching; Sub wavelength gratings

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; FABRICATION; SCANNING ELECTRON MICROSCOPY;

EID: 0036700788     PISSN: 02532239     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (10)

References (6)
  • 2
    • 0026204650 scopus 로고
    • Optimized antireflection coatings for high-efficiency silicon solar cells
    • Zhao J, Green M A. Optimized antireflection coatings for high-efficiency silicon solar cells. IEEE Trans. Electron Devices, 1991, 38 (8): 1925-1934
    • (1991) IEEE Trans. Electron. Devices , vol.38 , Issue.8 , pp. 1925-1934
    • Zhao, J.1    Green, M.A.2
  • 3
    • 0032651505 scopus 로고    scopus 로고
    • Analytical design of antireflection coatings for silicon photovoltaic devices
    • Nubile P. Analytical design of antireflection coatings for silicon photovoltaic devices. Thin Solid Films, 1999, 342 (1,2): 257-261
    • (1999) Thin Solid Films , vol.342 , Issue.1-2 , pp. 257-261
    • Nubile, P.1
  • 4
    • 0029769986 scopus 로고    scopus 로고
    • Design, fabrication, and characterization of subwavelength periodic structures for semiconductor antireflection coating in the visible domain
    • Lalanne P, Morris G M. Design, fabrication, and characterization of subwavelength periodic structures for semiconductor antireflection coating in the visible domain. Proc. SPIE, 1996, 2776: 300-309
    • (1996) Proc. SPIE , vol.2776 , pp. 300-309
    • Lalanne, P.1    Morris, G.M.2
  • 5
    • 0025385902 scopus 로고
    • Characterization of 23-percent efficient silicon solar cells
    • Green M A, Blakers A W, Zhao J et al.. Characterization of 23-percent efficient silicon solar cells. IEEE Trans. Electron Devices, 1990, 37 (2): 331-336
    • (1990) IEEE Trans. Electron. Devices , vol.37 , Issue.2 , pp. 331-336
    • Green, M.A.1    Blakers, A.W.2    Zhao, J.3
  • 6
    • 0031382389 scopus 로고    scopus 로고
    • Fast atom beam etching of glass materials with contact and non-contact masks
    • Toma Y, Hatakeyama M, Ichiki K et al.. Fast atom beam etching of glass materials with contact and non-contact masks. Jpn. J. Appl. Phys., 1997, 36 (12B): 7655-7659
    • (1997) Jpn. J. Appl. Phys. , vol.36 , Issue.12 B , pp. 7655-7659
    • Toma, Y.1    Hatakeyama, M.2    Ichiki, K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.