Transport limitations on development times of LIGA PMMA resists

Microsystem Technologies

Volumn 8, Issue 4-5, 2002, Pages 335-342

  Griffiths, S K ^a   Nilson, R H ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPUTER SIMULATION; MASKS; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

ACOUSTIC AGITATION;

POLYMETHYL METHACRYLATES;

LITHOGRAPHY;

EID: 0036692608     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-001-0165-3     Document Type: Conference Paper

References (16)

1. Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming and plastic moulding (LIGA process)
2. Accuracy limits and potential applications of the LIGA technique in integrated optics
3. Structural changes in poly(methyl methacrylate) during deep-etch X-ray synchrotron radiation lithography. Parts I, II, III
4. Influence of Secondary effects on the structure quality in deep X-ray lithographie
5. Development behavior of irradiated microstructures
6. New development strategies for high aspect ratio microstructures
7. Behavior of the developing process for ultradeep microstrauctures
8. Stokes flow in arbitrary two-dimensional shear flow over ridges and cavities
9. Effect of unsteady external flow on transfer to cavities
10. Transport limitations in electrodeposition for LIGA microdevice fabrication
11. Electroplating at high aspect ratio micro-patterned electrodes - Influence of mass transfer
12. Modeling acoustic agitation for enhanced development of LIGA PMMA resists
13. PMMA dose studies at various synchrotron sources and exposure/development conditions
14. Influence of developer temperature and resist material on the structure quality in deep X-ray lithography