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Journal of Applied Physics

Volumn 92, Issue 3, 2002, Pages 1604-1607

The effect of polarization on ultrashort pulsed laser ablation of thin metal films

(4) Venkatakrishnan, K a Tan, B a Stanley, P a Sivakumar, N R a

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION DEPTH; BEAM CONTROL; BEAM POLARIZATION; CONTINUOUS WAVE; DAMAGE THRESHOLD; EDGE QUALITY; KERF WIDTH; LASER CUTTING; LONG PULSE LASER; THIN METAL FILMS; ULTRASHORT-PULSED LASER;

ABLATION; LASER BEAMS; METALLIC FILMS; ULTRAFAST LASERS; ULTRASHORT PULSES;

POLARIZATION;

EID: 0036679332 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1487453 Document Type: Article

Times cited : (70)

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