Chemical vapor deposition (see abstract)

Thin Solid Films

Volumn 415, Issue 1-2, 2002, Pages 94-100

  Cheng, Wei Yuan ^a   Hong, Lu Sheng ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

CVD; Growth mechanism; Lead oxide; Lead zirconate titanate

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; FERROELECTRIC MATERIALS; FILM GROWTH; LEAD COMPOUNDS; OXIDES; REACTION KINETICS;

FERROELECTRIC FILMS;

THIN FILMS;

EID: 0036670055     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00546-1     Document Type: Article

References (10)