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Volumn 41, Issue 7 A, 2002, Pages 4659-4662
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Effect of heat treatment on structural characteristics and electric resistance in TaNx thin film deposited by RF sputtering
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Author keywords
Crystal structure; Heat treatment; Sheet resistance; TaN; X ray diffraction
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Indexed keywords
COMPOSITION EFFECTS;
CRYSTAL ORIENTATION;
CRYSTAL STRUCTURE;
ELECTRIC RESISTANCE;
HEAT TREATMENT;
MAGNETRON SPUTTERING;
NUMERICAL ANALYSIS;
POLYCRYSTALLINE MATERIALS;
THERMAL EFFECTS;
THIN FILMS;
X RAY CRYSTALLOGRAPHY;
X RAY DIFFRACTION ANALYSIS;
FACE CENTERED CUBIC;
SHEET RESISTANCE;
TANTALUM NITRIDE;
TANTALUM COMPOUNDS;
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EID: 0036655927
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.41.4659 Document Type: Article |
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Times cited : (11)
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References (12)
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