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Volumn 41, Issue 7 A, 2002, Pages
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Reduction of thickness of N-type microcrystalline hydrogenated silicon oxide film using different types of seed layer
a a a |
Author keywords
Dark conductivity; Hydrogenated silicon oxide; Microcrystallinity; Raman spectroscopy; Seed layer; Transmission electron microscopy (TEM); Tunnel junction
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Indexed keywords
CRYSTALLINE MATERIALS;
ELECTRIC CONDUCTIVITY;
HYDROGENATION;
OPTOELECTRONIC DEVICES;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAMAN SPECTROSCOPY;
SILICON COMPOUNDS;
SUBSTRATES;
TRANSMISSION ELECTRON MICROSCOPY;
DARK CONDUCTIVITY;
AMORPHOUS FILMS;
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EID: 0036651749
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.41.l787 Document Type: Article |
Times cited : (4)
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References (7)
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