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Volumn 41, Issue 7 A, 2002, Pages

Reduction of thickness of N-type microcrystalline hydrogenated silicon oxide film using different types of seed layer

Author keywords

Dark conductivity; Hydrogenated silicon oxide; Microcrystallinity; Raman spectroscopy; Seed layer; Transmission electron microscopy (TEM); Tunnel junction

Indexed keywords

CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY; HYDROGENATION; OPTOELECTRONIC DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON COMPOUNDS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0036651749     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l787     Document Type: Article
Times cited : (4)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.