Influence of hydrogen-surfactant coverage on Ge/Si(001) heteroepitaxy

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 41, Issue 7 A, 2002, Pages

  Fujino, Toshiaki ^a   Katayama, Mitsuhiro ^a   Yamazaki, Yujin ^a   Shin Ichi, Inoue ^a   Okuno, Tomohisa ^a   Oura, Kenjiro ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Elastic recoil detection analysis; Hydrogen surfactant; Ion scattering spectroscopy; Silicon, germanium

Indexed keywords

HYDROGEN; MONOLAYERS; SCATTERING; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SPECTROSCOPIC ANALYSIS; SURFACE ACTIVE AGENTS; SURFACE PHENOMENA;

ION SCATTERING SPECTROSCOPY;

SEMICONDUCTING GERMANIUM;

EID: 0036650622     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.l790     Document Type: Article

References (21)